Theoretical study using mathematical analysis supported by Matlab code was created, for Silicon dioxide (SiO2) thin films on various substrate materials (Aluminium, quartz, and silicon), and different thicknesses. Reflectance and transmittance of the (SiO2) thin film is strongly dependent on the electromagnetic wavelength. Many physical results were obtained. The results obtained serve as an illustration of the feasibility of simple techniques in measuring precisely the reflectance and absorptance of the (SiO2) thin film with an error not exceeding 0.1%. The reflectance and absorptance characteristics of multilayer thin film are strongly dependent on the wavelength of the electromagnetic waves. The effects of various substrate materials on the reflectance characteristics have been investigated by evaluating the reflectance curves of SiO2 thin films with thickness in the range of (100-1000) nm. The amplitude and periodicity of reflectance and absorptance changed with wavelength. Also the periodicity of this variety change with the film thickness and with the substrate material. In multilayer thin-film devices, the amount of light reflected at each interface can be adjusted by adjusting many factors like film thickness and substrate materials. beams phase can be adjusted by changing the layer thickness. There are thus two parameters associated with each layer, thickness and refractive index difference between film and substrate materials, which can be chosen to give the required performance.
| Published in | American Journal of Materials Synthesis and Processing (Volume 4, Issue 2) |
| DOI | 10.11648/j.ajmsp.20190402.14 |
| Page(s) | 75-80 |
| Creative Commons |
This is an Open Access article, distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution and reproduction in any medium or format, provided the original work is properly cited. |
| Copyright |
Copyright © The Author(s), 2019. Published by Science Publishing Group |
SiO2, Optical Properties, Thin Film, Matlab Code
| [1] | Ismail Oymak, Pelin Karadayı, Nuriye Sarıkaya, Tolga Tavşanoğlu > IMMC 2016 | 18th International Metallurgy & Materials Congres. |
| [2] | M. S. W. Vong, P. A. Sermon, Thin solid films, vol. 293, p. 185, (1997). |
| [3] | W. F. Win, B. S. Chiou, App. Surf. Sci., vol. 9 6, p 115 (1997). |
| [4] | A. Morales, A. Dura n, J. Sol-GelSci. Technol., vol. 8, P 451, (1997). |
| [5] | Yanyan Chen and Gang Jin, Ellipsometry, Spectroscopy V 21, no. 10, pp. 26-31, 2006. |
| [6] | A. Ranjgar, R. Norouzi, A. Zolanvari, and H. Sadeghi, Armenian Journal of Physics, vol. 6, issue 4, pp. 198-203, 2013. |
| [7] | N. Bouchenak Khelladi, N. E. Chabane Sari. American Journal of Optics and Photonics, vol. 1, no. 1, pp. 1-5, 2013. |
| [8] | S. A. Khodier, H. M. Sidki. journal of materials science: materials in electronics V 12, pp. 107-109, (2001). |
| [9] | P. hlubina, d. Ciprian, j. lunacek, m. lesnak. Appl. Phys. B, vol. 84, pp. 511–516, (2006). |
| [10] | Bhawana Joshi, Pratiksha Saxena, Natasha Khera. Proceedings of the 10th INDIACom; INDIACom-2016; IEEE Conference ID: 37465 2016 3rd International Conference on “Computing for Sustainable Global Development”, 16th - 18th March 2016, pp. 3871-3875. |
| [11] | Zhang X. and Stroud D, Optical and electrical properties of thin films, Physical Reviw B, vol. 52, no. 3, (1995). |
| [12] | Mark L. Sward, Captain, USAF, Presented to the Faculty of the School of Engineering of the Air Force Institute of Technology Air University In Partial Fulfillment of the Requirements for the Degree of Master of Science in Engineering Physics, Ohaio, (1990). |
| [13] | V A Kheraj, C J Panchal, M S Desal, and V Potbhare, pramana journal of physics, Indian Academy of Sciences, vol. 72, no. 6, pp. 1011-1022, (2009). |
| [14] | Md. Sultan Z and Sultana N, Journal of electrical and electronic systems, vol. 4, issu3, pp. 1-4, (2015). |
| [15] | Tomotake Niizeki, Sachiko Nagayama, Yoshio Hasegawa, Noboru Miyata, Masae Sahara, and Kazuhiro Akutsu. Substrate Dependence and Water Penetration Structure, Coatings, vol. 6, no. 64, pp. 1-11, (2016). |
| [16] | Nor Afifah Yahaya, Noboru Yamada, Yukio Kotaki, and Tadachika Nakayama. OPTICS EXPRESS, Vol. 21, No. 5, pp 5924-5940, March 2013. |
| [17] | Chao Wang, Li Zhao, Zihui Liang, Binghai Dong, Li Wan, and Shimin Wang, Science and Technology of Advanced Materials (Taylor & Frances Group), vol. 18, no. 1, pp. 563-573, (2017). |
| [18] | Anatoly Barybin and Victor Shapovalov, International Journal of Optics (Hindawi Publishing Corporation), vol 10, pp. 1-18 18, (2010). |
| [19] | Wen-Hao Cho, Donyau Chiang, Wen-Hong Wu, Yung-Hsiang Chen, Po-Kai Chiu, Shen-Yu Hsu, International Conference on Optics in Precision Engineering and Nanotechnology, Elsvier, Physics Procedia vol. 19, pp. 385–390, (2011). |
APA Style
Zina Abd Alameer Al Shadidi, Ahmad Kadhum Falih. (2019). Analysis of Optical Properties of SiO2 Thin Films for Various Thicknesses and Substrate Material Using Matlab Code. American Journal of Materials Synthesis and Processing, 4(2), 75-80. https://doi.org/10.11648/j.ajmsp.20190402.14
ACS Style
Zina Abd Alameer Al Shadidi; Ahmad Kadhum Falih. Analysis of Optical Properties of SiO2 Thin Films for Various Thicknesses and Substrate Material Using Matlab Code. Am. J. Mater. Synth. Process. 2019, 4(2), 75-80. doi: 10.11648/j.ajmsp.20190402.14
AMA Style
Zina Abd Alameer Al Shadidi, Ahmad Kadhum Falih. Analysis of Optical Properties of SiO2 Thin Films for Various Thicknesses and Substrate Material Using Matlab Code. Am J Mater Synth Process. 2019;4(2):75-80. doi: 10.11648/j.ajmsp.20190402.14
Share This Article
Twitter
Linked In
Facebook
Copy
Download@article{10.11648/j.ajmsp.20190402.14,
author = {Zina Abd Alameer Al Shadidi and Ahmad Kadhum Falih},
title = {Analysis of Optical Properties of SiO2 Thin Films for Various Thicknesses and Substrate Material Using Matlab Code},
journal = {American Journal of Materials Synthesis and Processing},
volume = {4},
number = {2},
pages = {75-80},
doi = {10.11648/j.ajmsp.20190402.14},
url = {https://doi.org/10.11648/j.ajmsp.20190402.14},
eprint = {https://article.sciencepublishinggroup.com/pdf/10.11648.j.ajmsp.20190402.14},
abstract = {Theoretical study using mathematical analysis supported by Matlab code was created, for Silicon dioxide (SiO2) thin films on various substrate materials (Aluminium, quartz, and silicon), and different thicknesses. Reflectance and transmittance of the (SiO2) thin film is strongly dependent on the electromagnetic wavelength. Many physical results were obtained. The results obtained serve as an illustration of the feasibility of simple techniques in measuring precisely the reflectance and absorptance of the (SiO2) thin film with an error not exceeding 0.1%. The reflectance and absorptance characteristics of multilayer thin film are strongly dependent on the wavelength of the electromagnetic waves. The effects of various substrate materials on the reflectance characteristics have been investigated by evaluating the reflectance curves of SiO2 thin films with thickness in the range of (100-1000) nm. The amplitude and periodicity of reflectance and absorptance changed with wavelength. Also the periodicity of this variety change with the film thickness and with the substrate material. In multilayer thin-film devices, the amount of light reflected at each interface can be adjusted by adjusting many factors like film thickness and substrate materials. beams phase can be adjusted by changing the layer thickness. There are thus two parameters associated with each layer, thickness and refractive index difference between film and substrate materials, which can be chosen to give the required performance.},
year = {2019}
}
TY - JOUR T1 - Analysis of Optical Properties of SiO2 Thin Films for Various Thicknesses and Substrate Material Using Matlab Code AU - Zina Abd Alameer Al Shadidi AU - Ahmad Kadhum Falih Y1 - 2019/11/25 PY - 2019 N1 - https://doi.org/10.11648/j.ajmsp.20190402.14 DO - 10.11648/j.ajmsp.20190402.14 T2 - American Journal of Materials Synthesis and Processing JF - American Journal of Materials Synthesis and Processing JO - American Journal of Materials Synthesis and Processing SP - 75 EP - 80 PB - Science Publishing Group SN - 2575-1530 UR - https://doi.org/10.11648/j.ajmsp.20190402.14 AB - Theoretical study using mathematical analysis supported by Matlab code was created, for Silicon dioxide (SiO2) thin films on various substrate materials (Aluminium, quartz, and silicon), and different thicknesses. Reflectance and transmittance of the (SiO2) thin film is strongly dependent on the electromagnetic wavelength. Many physical results were obtained. The results obtained serve as an illustration of the feasibility of simple techniques in measuring precisely the reflectance and absorptance of the (SiO2) thin film with an error not exceeding 0.1%. The reflectance and absorptance characteristics of multilayer thin film are strongly dependent on the wavelength of the electromagnetic waves. The effects of various substrate materials on the reflectance characteristics have been investigated by evaluating the reflectance curves of SiO2 thin films with thickness in the range of (100-1000) nm. The amplitude and periodicity of reflectance and absorptance changed with wavelength. Also the periodicity of this variety change with the film thickness and with the substrate material. In multilayer thin-film devices, the amount of light reflected at each interface can be adjusted by adjusting many factors like film thickness and substrate materials. beams phase can be adjusted by changing the layer thickness. There are thus two parameters associated with each layer, thickness and refractive index difference between film and substrate materials, which can be chosen to give the required performance. VL - 4 IS - 2 ER -
Information
Email: