Corrosion Behaviour of CNT Reinforced AA 7075 Nanocomposites
B. Thirumaran,
S. Natarajan,
S. P. Kumaresh
Issue:
Volume 2, Issue 1, February 2013
Pages:
1-5
Received:
19 January 2013
Accepted:
Published:
20 February 2013
Abstract: Carbon nanotubes reinforced AA 7075 alloy was fabricated by powder metallurgy route. Multi-walled carbon nanotubes (MWCNTs) were synthesized by electric arc discharge method. Different mass fraction of CNTs was added to the AA 7075 and the powder mixtures were consolidated using uniaxial press. The consolidated samples were sintered at 600˚ C in inert atmosphere followed by hot compaction at 450˚ C. The electrochemical corrosion behaviour of AA 7075 and CNT reinforced AA 7075 was studied using Electrochemical Polarization Technique (ACM Gill) and Electrochemical Impedance Technique. The relative densities of the composites were measured. The phase analysis and surface morphology of the composites were done by XRD and scanning electron microscope (SEM). The corrosion behaviour of the composites and the possible mechanism for the effect of CNT in the properties have been studied in detail in this paper.
Abstract: Carbon nanotubes reinforced AA 7075 alloy was fabricated by powder metallurgy route. Multi-walled carbon nanotubes (MWCNTs) were synthesized by electric arc discharge method. Different mass fraction of CNTs was added to the AA 7075 and the powder mixtures were consolidated using uniaxial press. The consolidated samples were sintered at 600˚ C in in...
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Synthesis of Silicon Nanostructures: Comparative Study
Issue:
Volume 2, Issue 1, February 2013
Pages:
6-11
Received:
23 December 2012
Accepted:
Published:
20 February 2013
Abstract: Silicon nanoparticles/nanostructures have been prepared by different methods. Lasers of different operational modes have been employed to prepare silicon nanoparticles by laser-induced etching, laser ablation and laser annealing. Moreover, electrochemical and photoelectrochemical etching were performed to synthesize silicon nanostructures. Optimum etching rate of 2.4 µm/min is obtained for the porous layer prepared by electrochemical etching under optimum conditions of 15 mA/cm2 and 10 minutes etching current density and etching time, respectively. Characterization of the prepared silicon nanostructures / nanoparticles was carried out using various methods. The experimentally observed Raman spectra of nanostructured layers prepared by three etching techniques reveal a red shift to 518 cm-1 and line broadening of 12 cm-1. While fitting of these spectra with the quantum confinement model provide an average size for nanostructured layers 6, 5.5 and 2 nm for photochemical, electrochemical and phooelectrochemical etching, respectively. The surface morphology investigation and their analysis provide valuable details on silicon nanostructure/nanoparticle size and size distribution.
Abstract: Silicon nanoparticles/nanostructures have been prepared by different methods. Lasers of different operational modes have been employed to prepare silicon nanoparticles by laser-induced etching, laser ablation and laser annealing. Moreover, electrochemical and photoelectrochemical etching were performed to synthesize silicon nanostructures. Optimum ...
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